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Olga
Kaplounenko
Coherent Inc.
5100 Patrick Henry Drive
Santa Clara, CA 95054
Phone: (408) 764-4184
E-mail: olga@kapl.addr.com
EDUCATION
Moscow
Power Institute (Moscow, Russia).
Master of Science in Electrical
Engineering, 1987
OBJECTIVE
Challenging position in
manufacturing management in a growth-oriented organization, which offers
diverse job responsibilities.
PROFESSIONAL EXPERIENCE
Coherent,
Inc.
Sr. Mfg. Supervisor (wafer process),
March 2002 – present
Responsibilities:
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Interview and hire technicians and engineers
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Order clean room supplies
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Schedule work in the processing area
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Select material for processing
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Release work orders in Oracle ERP system and
complete them
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Check final product test results and initiate
shipments of the finished goods to customers
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Maintain and update documentation in wafer
processing area
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Perform inventory transactions, keep accurate
inventory count
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Work on regular basis with the following
databases: Lotus Notes, Agile PDM, Oracle ERP
Process Development Engineer,
November 1999 – March 2002
Responsibilities:
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Support all wafer fabrication areas,
including Contact Photolithography, Wet Etch, E-beam evaporation, PECVD,
Dry Etch (RIE), RTA, develop new processes
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Design masks for the photolithography
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Create qualification procedures for all
equipment (after preventive maintenance and downtime)
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Create and maintain Part Number records in
several databases
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Create and maintain documentation: followers,
processing instructions
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Develop and document training procedures,
train new personnel
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Perform laser diode bar inspections in SEM
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Test laser diode bars, investigate bar
performance at different operation settings
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Purchase lab equipment
Process Technician (wafer process), September
1997 – November 1999
Responsibilities:
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Work in laser diode fabrication, process GaAs
EPI wafers through all processing steps: photolithography, wet etch, dry
etch, PECVD, RTA and metallization, backside processing (lapping and
chemical polishing).
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Collect data for SPC
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Work with processing databases, open work
orders.
Equipment used: CEE spinner and
hot plate, Karl Suss and OAI mask aligners, RTA, Oxford PECVD and RIE
chambers, Temeskal E-beam evaporator, Logitech lapper, Rudolph ellipsometer,
KLA-Tencor profilometers.
Chalmers
Technical University, Gothenburg, Sweden
Process
Development Engineer (Guest Researcher), October 1994 – May 1995
NKT
Research Center, Glostrop, Denmark
Guest
Researcher, July 1993 – August 1993
Institute
of Radio Engineering and Electronics (Russian Academy of Sciences), Moscow,
Russia
Junior Scientific Researcher, January 1990 –
April 1996
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Worked on developing of new processes for
superconducting chip fabrication on Si, glass and quarts substrates.
Performed photolithography, dry etch, lift-off, evaporation and sputtering
of different metals and dielectrics.
State
Institute of Oil and Gas Industry, Moscow, Russia
Design
engineer, March 1887 – December 1889
REFERENCES
AVAILABLE UPON REQUEST
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